AMD, which specialises in cutting-edge materials science, said this was an important milestone that followed the development of a range of materials for its product portfolio.
Chief executive John Lee said, "The granting of this patent in the US for AMD is strong validation of the efforts of everyone within the company and our external research partners and will enable us to progress rapidly with the commercialisation of our products.
"Our energy-efficient process allows us to produce materials fit for the marketplace at the right price and with low overall energy consumption. AMD continues to develop and protect IP through a number of patent family filings where it considers it has a strong solution and a clear route to market."
The patent covers the production of 2D nanomaterials from bulk materials using a high-pressure homogenisation process in aqueous or organic solvents.
The primary application is in producing graphene-based materials, including graphene nanoplatelets and few-layer graphene. A range of highly conductive hybrid inks and coatings is possible through careful formulation with other ingredients.
AMD's nHance inks offer a low-cost, recyclable connected way of making green RFID antennas, printed flexible electronics and EMI/RF shielding.
Last year they were selected for the material library of Material ConneXion, which is widely regarded as an authority on materials.
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