The 66th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 66th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies.

Topics:

- Advanced micro/nanolithography
- AR/VR devices
- Atomically precise fabrication
- Bioinspired nanostructures and engineered surfaces
- Cold atom ion and electron sources
- Cutting-edge industrial developments
- Directed self-assembly
- Electron and ion-beam lithography
- Felexible/wearable electronics and sensors
- Implantable devices
- Metamaterials, metasurfaces, and meta-optics
- Micro/nanoelectromechanical systems (MEMS/NEMS)
- Micro/nanofluidics
- Nano-biology and medicine
- Nanoelectronics
- Nanofabrication for energy applications
- Nanofabrication for neuromorphic computing
- Nanofabrication for quantum computing
- Nanoimprint lithography
- Nanophotonics and plasmonics
- Novel architectures and 2.5D/3D integration
- Personalized healthcare
- Resists and resist processing
- Scalable micro/nanomanufacturing
- Scanning probes techniques
- Simulation, modeling, and design tools for nanofabrication
- Structural color and displays
- Synthesis and integration of 0D/1D/2D nanomaterials