Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
| Standard Number | ISO 23170:2022 |
|---|---|
| Organization |
International Organization for Standardization
|
| Level | International |
| Category | Test Method | Characterization | Measurement |
| Status |
|
ABSTRACT
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).