Impact of film thickness in laser-induced periodic structures on amorphous Si films

Since the scientists at Bell Labs invented the world's first transistor in December 1947, a revolution in microelectronics technology has profoundly affected lifestyles worldwide. As electronics get smaller and smaller, it is a challenge to find an easy, fast, and low-cost way to fabricate micro-nano components. Traditional direct writing fabrication methods such as mechanical scribing, focused ion beam etching, electron beam lithography, multiphoton polymerization, and thermal scanning probe etching are inefficient.