New tool measures plasma source and color of light simultaneously to improve microchip production
Date | 13th, Sep 2023 |
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Source | Phys.org - Scientific News Websites |
DESCRIPTION
Researchers at MESA+ Institute for Nanotechnology developed a tool that can measure the size of a plasma source and the color of the light it emits simultaneously. "Measuring both at the same time enables us to further improve lithography machines for smaller, faster and improved chips." The article is highlighted as an Editor's pick in Optics Letters.