Atomic layer deposition route to scalable, electronic-grade van der Waals Te thin films
Date | 18th, Sep 2023 |
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Source | Nanowerk - Nanotechnology Websites |
DESCRIPTION
Researchers have made a significant breakthrough in thin film deposition technology. By employing an innovative atomic layer deposition (ALD) process, they successfully achieved regular arrangement of tellurium atoms at low temperatures as low as 50 degrees Celsius.