$10B Earmarked for Development of Extreme-UV Lithography Center
| Date | 13th, Dec 2023 |
|---|---|
| Source | Photonics Media - Scientific News Websites |
DESCRIPTION
A high-numerical aperture extreme-ultraviolet (NA EUV) lithography center is set to be built at the NanoTech Complex semiconductor research facility in Albany, N.Y. The state of New York partnered with IBM, Micron, Applied Materials, and Tokyo Electron, among others, to invest in expanding NY CREATES’ Albany NanoTech Complex where IBM is one of the key members.