Collaborative review unveils the potential of graphene in advancing nitride semiconductor technology
Date | 29th, Dec 2023 |
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Source | Phys.org - Scientific News Websites |
DESCRIPTION
In a comprehensive review, researchers from Soochow University, Beijing Graphene Institute and Xiamen Silan Advanced Compound Semiconductor Co., Ltd. have collaborated to provide a systematic overview of the progress and potential applications of graphene as a buffer layer for nitride epitaxial growth.