Atomic Layer Deposition Method Reduces Use of Precious Metals
Date | 4th, Jan 2024 |
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Source | AZoNano - Nanotechnology Websites |
DESCRIPTION
Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made significant strides toward the discovery of precisely controlled atomic layer deposition (ALD) incorporation of precious metals (Ru, Ir, Pt, and Pd).