Mussle-inspired coating process enables rapid fabrication of wafer-scale nanoparticle films
Date | 9th, Feb 2024 |
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Source | Nanowerk - Nanotechnology Websites |
DESCRIPTION
Researchers developed an innovative biomimetic technique enabling swift electrostatic assembly of functional nanoparticle monolayers across entire silicon wafers within seconds, over 100-1000 times faster than previous methods.