Opto-thermoplasmonic patterning of 2D materials

Researchers have developed an all-optical lithographic technique called 'optothermoplasmonic nanolithography' (OTNL) to achieve high-throughput, versatile, and maskless patterning of different atomic layers. Taking graphene and molybdenum disulfide monolayers as examples, the team shows that both thermal oxidation and sublimation in the light-directed temperature field can lead to direct etching of the atomic layers. They further demonstrates programmable patterning of 2D materials into complex and large-scale nanostructures by steering the laser beam.