Ice lithography: Opportunities and challenges in 3-D nanofabrication

Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography (EBL), which makes patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication. In the past decade, significant progress has been made in electron-beam-based nanofabrication, such as the emerging ice lithography (IL) technology, in which ice thin-films are used as resists and patterned by a focused electron-beam. The entire process of IL nanofabrication is sustainable and streamlined because spin coating and chemical developing steps commonly required for EBL resists are made needless.