Researchers obtain atomically thin molybdenum disulfide films on large-area substrates

Researchers from the Moscow Institute of Physics and Technology have managed to grow atomically thin films of molybdenum disulfide spanning up to several tens of centimeters square. It was demonstrated that the material's structure can be modified by varying the synthesis temperature. The films, which are important to electronics and optoelectronics, were obtained at 900-1,000° Celsius. The findings were published in the journal ACS Applied Nano Materials.