Picosun’s ALD Technology Helps to Fight Climate Change
| Date | 31st, Jan 2020 |
|---|---|
| Source | AZoNano - Nanotechnology Websites |
DESCRIPTION
Picosun’s Atomic Layer Deposition (ALD) thin film barrier coating technology offers a solution for eliminating the use of hazardous process gases, sulphur hexafluoride (SF6) and nitrogen...