Novel photoresist enables 3-D printing of smallest porous structures

Researchers of Karlsruhe Institute of Technology (KIT) and Heidelberg University have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range. In Advanced Materials, the scientists report how porosity can be controlled during printing and how this affects light scattering properties of the microstructures.