Novel photoresist enables 3D printing of smallest porous structures: Researchers of the cluster of excellence 3D matter made to order expand possibilities of two-photon microprinting

Researchers have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range. The scientists report how porosity can be controlled during printing and how this affects light scattering properties of the microstructures.