E-beam atomic-scale 3-D 'sculpting' could enable new quantum nanodevices

By varying the energy and dose of tightly focused electron beams, researchers have demonstrated the ability to both etch away and deposit high-resolution nanoscale patterns on two-dimensional layers of graphene oxide. The 3-D additive/subtractive "sculpting" can be done without changing the chemistry of the electron beam deposition chamber, providing the foundation for building a new generation of nanoscale structures.