The EIPBN Conference is recognized as the foremost
international meeting dedicated to lithographic science and technology and its
application to micro and nanofabrication techniques. The conference brings
together engineers and scientists from industries and universities from all
over the world to discuss recent progress and future trends. The important topics:
Micro- and Nanolithography
- Electron and Ion beam lithography
- Optical and Extreme UV (EUV) lithography
- Nano-imprint lithography
- Maskless and high throughput direct write lithography
- 3D micro and nanolithography
- Resists and lithographic support materials
- Mask, template and stencil fabrication
- Directed self-assembly
- Tip-based and scanning probe lithography
- Electron and Ion beam sources and optics
- Large area nanoscale patterning
- Simulation and modeling of patterning technologies
- Lithography for packaging and 3D integration
Process and Metrology Technologies
- Electron, ion and photon beam stimulated etching and
deposition
- Ion beam microscopy including Ga, He, Li and novel
sources
- Multibeam and high throughput imaging instruments
- Nanoparticle and nanotube assembly and placement
- Advanced pattern transfer concepts
- Aberration corrected electron beam instruments
- Process simulation and modeling
- Nanomanipulation and precision placement
- Advanced scanning probe and tip-based imaging
- Processing for novel 2D materials (MoSs, grapheme
Applications and Emerging Topics
- Nanoelectronics and Bio-nanoelectronics
- Nanostructured Interfaces to Biology
- Patterned media
- High density solid state storage & nonvolatile
memory devices
- Nanophotonics and plasmonics
- Nanobiology and nanomedicine
- Micro- and nano-fluidics
- Carbon-based nanodevices (CNTs & graphene)
- Nanofabrication for energy sources
- Micro- and nano-scale mechanical devices and MEMs
- DNA origami and biologically inspired assembly
Canada - San Diego
