Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Standard Number BS ISO 23170:2022
Organization British Standards Institution UK
Level National
Category Test Method | Characterization | Measurement
Status
  • AUG 2022 Published
ABSTRACT

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).