Nanomanufacturing — Key controlling properties — Part 6-3: Graphene-based materials — Domain size: Substrate oxidation methods

IEC 62607 presents a standard method for determining the following key control characteristics: — Determination of domain size by substrate oxidation method This standard provides a quick, convenient and reliable measurement method for determining the domain size of graphene grown on Cu thin plates or Cu thin films. This method can help understand the effect of graphene domain size on the properties of graphene and find ways to improve the performance of high-speed, flexible, and transparent devices using CVD graphene. — The domain size measured using this standard is presented as one of the main control characteristic standard items in the blank detail specification for graphene, IEC 62565-03-01. Domain density can be interpreted in the same way as domain size, but is not used in this document. — The domain size suggested by the measurement method of this standard is defined as the average size of the domain measured in the area presented by the supplier. Domain size is expressed in cm2 or μm2. — This standard measurement method can be applied to graphene grown on copper thin films or copper sheets by chemical vapor deposition. Analysis of graphene grown on copper sheets is performed before transferring the graphene to another substrate. — Since this standard measurement method is a destructive method, the sample used for analysis cannot be re-introduced and used in the device manufacturing process.