Nanotechnology - Fabrication of three dimensional nanostructures and devices - A strain method induced by ion beam irradiation

This document describes the processing method of ion beam irradiation-induced strain technology to construct three-dimensional nanostructures and devices, mainly including processing principles, Materials and equipment, environmental conditions, processing methods. This document is applicable to ion beam irradiation to induce spatial strain of vertical nanowires and planar nanofilms, and then realize the three-dimensional space by a Three-dimensional nanostructures and devices composed of two-dimensional nanowires and two-dimensional nanofilms.