Demand for oxide-nitride layer structures has increased due to their potential in enabling next-generation energy-efficient nanodevices and advanced data storage. The Nano-systems from Ions, Spins and Electrons (NISE) department at the MPI-MSP will leverage Veeco’s MBE technology to expand research and develop innovative applications.
"Our team is highly interested in exploring the properties of atomically engineered oxide-nitride layer structures, especially because of their extraordinary properties but also for their potential in paving the way to novel energy-efficient nanodevices,” said Stuart Parkin, director of the NISE Department at the MPI-MSP. “Veeco’s reputation and expertise in MBE combined with the GEN10’s high reliability, throughput, customization, and automation capabilities will help support our research into novel materials.”
This win at MPI marks the first time Veeco has provided a fully integrated solution for a concentrated ozone source. The GEN10 allows for up to three configurable, material-specific growth modules, enabling high system utilization and allowing multiple researchers to use the system at the same time to perform unattended growth. By expanding its reach in the R&D sector worldwide, Veeco is leading the way in helping to grow complex oxide structures.
“As our MBE systems continue to expand their footprint in the global R&D space, we are honored that Veeco’s GEN10 MBE system was selected by the highly respected Max Planck Institute of Microstructure Physics in Halle,” said Gerry Blumenstock, vice president and general manager of MBE and atomic layer deposition products at Veeco. “We are pleased with the confidence Dr. Parkin and his team placed in our MBE expertise, and we look forward to supporting the MPI-MSP as it continues to lead R&D exploration and applications for complex oxides.”
Veeco is a manufacturer of innovative semiconductor process equipment.
