Surface chemical analysis Depth profiling Non destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
| Standard Number | NEN-ISO 23170:2022 |
|---|---|
| Organization |
Netherlands Standardization Institute
|
| Level | National |
| Category | Test Method | Characterization | Measurement |
| Status |
|
ABSTRACT
NEN-ISO 23170 specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).