Surface chemical analysis Depth profiling Non destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Surface chemical analysis Depth profiling Non destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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Standard Number NEN-ISO 23170:2022
Organization Netherlands Standardization Institute Netherlands
Level National
Category Test Method | Characterization | Measurement
Status
  • JUL 2022 Published
ABSTRACT

NEN-ISO 23170 specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).